✦ LIBER ✦

Plasma-enhanced chemical vapor deposition of phosphorus nitride thin films: Auger spectroscopy characterization

✍ Scribed by J.L. Leclercq; J. Durand; L. Cot; R. Berjoan; C. Dupuy

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Growth and characterization of silicon-n

✍ I.K. Han; Y.J. Lee; J.W. Jo; J.I. Lee; K.N. Kang 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 310 KB

Factorial experimental investigation of

✍ C.-S. Yoo; A.G. Dixon 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 382 KB

Annealing of silicon nitride thin films

✍ J.C. Bruyère; B. Reynes; C. Savall; C. Roch 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 515 KB

Thin film deposition on inside surfaces

✍ Frank Jansen; Steven Krommenhoek 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 474 KB

Potentiostatic testing of thin film alum

✍ Richard K. Ulrich; Donghyen Yi; William D. Brown; Simon S. Ang 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 595 KB

Deposition of thin films of Zirconium an

✍ Silvia Reich; Prof. Harald Suhr; Klára Hankó; Prof. László Szepes 📂 Article 📅 1992 🏛 John Wiley and Sons 🌐 English ⚖ 437 KB 👁 2 views