Deposition of thin films of Zirconium and Hafnium Boride by plasma enhanced chemical vapor deposition
✍ Scribed by Silvia Reich; Prof. Harald Suhr; Klára Hankó; Prof. László Szepes
- Publisher
- John Wiley and Sons
- Year
- 1992
- Tongue
- English
- Weight
- 437 KB
- Volume
- 4
- Category
- Article
- ISSN
- 0935-9648
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
The effects of hydrogen on GaN growth by remote plasma-enhanced metal-organic chemical vapor deposition (RPE-MOCVD) were investigated. Hydrogen addition changed the gas-phase reaction in the plasma and resulted in a Ga excess growth condition by scavenging activated nitrogen species, resulting in de
Micropatterned surfaces have received extensive attention for possible applications in advanced technologies including microelectronics, [1,2] microfluidics, [3,4] cell-growth confinement, [5,6] and biosensor fabrication. [7,8] The latter two applications exemplify the increasing coordination betwee