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Microhardness and other properties of hydrogenated amorphous silicon carbide thin films formed by plasma-enhanced chemical vapor deposition

✍ Scribed by M.A. Bayne; Z. Kurokawa; N.U. Okorie; B.D. Roe; L. Johnson; R.W. Moss

Publisher: Elsevier Science
Year: 1983
Tongue: English
Weight: 287 KB
Volume: 107
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(83)90022-6

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