Reactivity of organosilicon precursors in remote hydrogen microwave plasma chemical vapor deposition of silicon carbide and silicon carbonitride thin-film coatings

✍ Scribed by A. M. Wrobel; A. Walkiewicz-Pietrzykowska; I. Blaszczyk-Lezak

• Publisher: John Wiley and Sons
• Year: 2010
• Tongue: English
• Weight: 472 KB
• Volume: 24
• Category: Article
• ISSN: 0268-2605
• DOI: 10.1002/aoc.1589