Silicon carbonitride thin-film coatings fabricated by remote hydrogen–nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings

✍ Scribed by A. M. Wrobel; I. Blaszczyk-Lezak; A. Walkiewicz-Pietrzykowska

• Publisher: John Wiley and Sons
• Year: 2007
• Tongue: English
• Weight: 161 KB
• Volume: 105
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/app.26109