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Remote hydrogen plasma chemical vapor deposition of silicon–carbon thin-film materials from a hexamethyldisilane source: Characterization of the process and the deposits

✍ Scribed by A. M. Wróbel; A. Walkiewicz-Pietrzykowska; J. E. Klemberg-Sapieha; Y. Hatanaka; T. Aoki; Y. Nakanishi

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