𝔖 Bobbio Scriptorium
✦   LIBER   ✦

ChemInform Abstract: Deposition of Electrochromic Tungsten Oxide Thin Films by Plasma- Enhanced Chemical Vapor Deposition.

✍ Scribed by W. B. HENLEY; G. J. SACKS

Publisher
John Wiley and Sons
Year
2010
Weight
27 KB
Volume
28
Category
Article
ISSN
0931-7597

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

ChemInform Abstract: Metalorganic Chemic
ChemInform Abstract: Metalorganic Chemical Vapor Deposition of Indium Selenide Thin Films.
✍ S. L. STOLL; A. R. BARRON πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons βš– 33 KB

InSe films are grown at 230-420 β€’ C by low-pressure MOCVD from [(tBu) 2 In(Β΅-SetBu)] 2 and [(Me 2 EtC)In(Β΅ 3 -Se)] 4 . Energy-dispersive X-ray analysis shows that films grown from the first precursor are In rich, while those from the second one are stoichiometric InSe. At temperatures Β‘ 330 β€’ C ball

ChemInform Abstract: Electrochemistry of
ChemInform Abstract: Electrochemistry of Chemical Vapor Deposited Tungsten Films with Relevance to Chemical Mechanical Polishing.
✍ E. A. KNEER; C. RAGHUNATH; S. RAGHAVAN; J. S. JEON πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons βš– 27 KB πŸ‘ 1 views

Electrochemistry of Chemical Vapor Deposited Tungsten Films with Relevance to Chemical Mechanical Polishing. -The passivation and etching behavior of CVD tungsten films under acidic conditions relevant to chemical mechanical polishing is studied by electrochemical and XPS methods. According to dc p