✦ LIBER ✦

ChemInform Abstract: Germanium Thin Film Formation by Low-Pressure Chemical Vapor Deposition.

✍ Scribed by Z. MENG; Z. JIN; B. A. GURURAJ; P. CHU; H. S. KWOK; M. WONG

Publisher: John Wiley and Sons
Year: 2010
Weight: 29 KB
Volume: 28
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.199732012

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

ChemInform Abstract: Tungsten Oxide Thin

ChemInform Abstract: Tungsten Oxide Thin Films Chemically Vapor Deposited at Low Pressure by W(CO)6 Pyrolysis.

✍ D. DAVAZOGLOU; A. MOUTSAKIS; V. VALAMONTES; V. PSYCHARIS; D. TSAMAKIS 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 34 KB 👁 1 views

ChemInform Abstract: Chemical Vapor Depo

ChemInform Abstract: Chemical Vapor Deposition of Gallium Sulfide Thin Films.

✍ Seigi Suh; David M. Hoffman 📂 Article 📅 2001 🏛 John Wiley and Sons ⚖ 33 KB 👁 1 views

ChemInform Abstract: Deposition of Elect

ChemInform Abstract: Deposition of Electrochromic Tungsten Oxide Thin Films by Plasma- Enhanced Chemical Vapor Deposition.

✍ W. B. HENLEY; G. J. SACKS 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 27 KB 👁 2 views

ChemInform Abstract: Metalorganic Chemic

ChemInform Abstract: Metalorganic Chemical Vapor Deposition of Indium Selenide Thin Films.

✍ S. L. STOLL; A. R. BARRON 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 33 KB 👁 1 views

InSe films are grown at 230-420 • C by low-pressure MOCVD from [(tBu) 2 In(µ-SetBu)] 2 and [(Me 2 EtC)In(µ 3 -Se)] 4 . Energy-dispersive X-ray analysis shows that films grown from the first precursor are In rich, while those from the second one are stoichiometric InSe. At temperatures ¡ 330 • C ball

ChemInform Abstract: A Two-Step Low Pres

ChemInform Abstract: A Two-Step Low Pressure Chemical Vapor Deposition Process for the Production of Tungsten Metal Thin Films.

✍ D. V. BAXTER; K. G. CAULTON; M. H. CHISHOLM; S.-H. CHUANG; C. D. MINEAR 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 39 KB 👁 2 views

ChemInform Abstract: Deposition of Cadmi

ChemInform Abstract: Deposition of Cadmium Sulfide Thin Films from the Single-Source Precursor Bis(diethylmonothiocarbamato)cadmium(II) by Low-Pressure Metallorganic Chemical Vapor Deposition.

✍ M. CHUNGGAZE; M. A. MALIK; P. O'BRIEN 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 32 KB 👁 2 views