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ChemInform Abstract: A Two-Step Low Pressure Chemical Vapor Deposition Process for the Production of Tungsten Metal Thin Films.

✍ Scribed by D. V. BAXTER; K. G. CAULTON; M. H. CHISHOLM; S.-H. CHUANG; C. D. MINEAR


Publisher
John Wiley and Sons
Year
2010
Weight
39 KB
Volume
29
Category
Article
ISSN
0931-7597

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