𝔖 Bobbio Scriptorium
✦   LIBER   ✦

ChemInform Abstract: Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal—Organic Chemical Vapor Deposition.

✍ Scribed by Mike R. Lazell; Paul O'Brien; David J. Otway; Jin-Ho Park


Publisher
John Wiley and Sons
Year
2010
Weight
36 KB
Volume
31
Category
Article
ISSN
0931-7597

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


ChemInform Abstract: Deposition of Thin
✍ Graeme A. Horley; Mike R. Lazell; Paul O'Brien 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 33 KB 👁 2 views

Deposition of Thin Films of Gallium Sulfide from a Novel Liquid Single-Source Precursor, Ga(SOCNEt 2 ) 3 , by Aerosol-Assisted CVD. -The novel liquid gallium monothiocarbamato complex (III) is utilized as a single-source precursor for the deposition of face-centered cubic GaS films on glass substra

ChemInform Abstract: The Synthesis and T
✍ J. MCALEESE; J. A. DARR; B. C. H. STEELE 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 31 KB 👁 2 views

The Synthesis and Thermal Evaluation of a Novel Cerium Precursor to Grow Thick Ceria Films by Metal-Organic Chemical Vapor Deposition ( MOCVD). -The novel liquid precursor ((Ce(fod)3)2tetraglyme) (fod-H: 1,1,1,2,2,3,tetraglyme: MeO(CH2CH2O) 4Me) is prepared and characterized by NMR, TGA, and powder