ChemInform Abstract: The Synthesis and Thermal Evaluation of a Novel Cerium Precursor to Grow Thick Ceria Films by Metal-Organic Chemical Vapor Deposition ( MOCVD).

✍ Scribed by J. MCALEESE; J. A. DARR; B. C. H. STEELE

• Publisher: John Wiley and Sons
• Year: 2010
• Weight: 31 KB
• Volume: 28
• Category: Article
• ISSN: 0931-7597
• DOI: 10.1002/chin.199705027

✦ Synopsis

The Synthesis and Thermal Evaluation of a Novel Cerium Precursor to Grow Thick Ceria Films by Metal-Organic Chemical Vapor Deposition ( MOCVD). -The novel liquid precursor ((Ce(fod)3)2tetraglyme) (fod-H: 1,1,1,2,2,3,tetraglyme: MeO(CH2CH2O) 4Me) is prepared and characterized by NMR, TGA, and powder XRD methods. Its potential as a CVD Ce precursor is determined by TGA and DSC. Thick, crystalline ceria films are grown onto polycrystalline zirconia at reduced pressure. The incorporation of fluorine, which is observed only at low temp. (350 • C), can be minimized by use of moist oxygen as reactor gas and is further reduced by post annealing. By addition of a suitable Gd precursor in the vapor phase, this precursor is supposed to be useful for the deposition of Ce1-xGdxO2-x/2 films. -(MCALEESE,