Stress hysteresis during thermal cycling of plasma-enhanced chemical vapor deposited silicon oxide films

✍ Scribed by Thurn, Jeremy; Cook, Robert F.

• Book ID: 127053474
• Publisher: American Institute of Physics
• Year: 2002
• Tongue: English
• Weight: 288 KB
• Volume: 91
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.1432773