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Electrical properties of hafnium oxide gate dielectric deposited by plasma enhanced chemical vapor deposition

✍ Scribed by Choi, Kyu-Jeong; Shin, Woong-Chul; Park, Jong-Bong; Yoon, Soon-Gil


Book ID
126946466
Publisher
Taylor and Francis Group
Year
2001
Tongue
English
Weight
403 KB
Volume
38
Category
Article
ISSN
1058-4587

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