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Electrical properties of PZT thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

โœ Scribed by S.T. Kim; J.W. Kim; S.W. Jung; J.S. Shin; S.T. Ahn; W.J. Lee


Book ID
113300725
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
421 KB
Volume
45
Category
Article
ISSN
0254-0584

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Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p