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Characterization of ZnO thin film deposited by electron cyclotron resonance plasma-assisted chemical vapor deposition

✍ Scribed by Isao Sakaguchi; Haruki Ryoken; Shunichi Hishita; Hajime Haneda

Book ID
108289026
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
231 KB
Volume
506-507
Category
Article
ISSN
0040-6090

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Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p