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Characterization of electron cyclotron resonance process plasma and film deposition

✍ Scribed by Shoji Miyake; Wei Chen

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 558 KB
Volume: 139
Category: Article
ISSN: 0921-5093
DOI: 10.1016/0921-5093(91)90632-w

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