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Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

✍ Scribed by C. Biasotto; J.A. Diniz; A.M. Daltrini; S.A. Moshkalev; M.J.R. Monteiro

Book ID
108290059
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
390 KB
Volume
516
Category
Article
ISSN
0040-6090

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Wet etching studies of silicon nitride t
Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition
✍ K.B. Sundaram; R.E. Sah; H. Baumann; K. Balachandran; R.M. Todi πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 194 KB

Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p