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Deposition of dielectrics using a matrix distributed electron cyclotron resonance plasma enhanced chemical vapor deposition system

✍ Scribed by R. Botha; B. Haj Ibrahim; P. Bulkin; B. Drévillon


Book ID
108289552
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
470 KB
Volume
515
Category
Article
ISSN
0040-6090

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Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p