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Pulsed plasma deposition from 1,1,2,2-tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition

✍ Scribed by Catherine B. Labelle; Karen K. Gleason

Publisher: John Wiley and Sons
Year: 2001
Tongue: English
Weight: 186 KB
Volume: 80
Category: Article
ISSN: 0021-8995
DOI: 10.1002/app.1308

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