Study on the electron cyclotron resonance plasma chemical vapor deposition of carbon nanotubes
โ Scribed by Zhi Wang; Dechun Ba; Peijiang Cao; ChunhongYu; Ji Liang
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 609 KB
- Volume
- 140
- Category
- Article
- ISSN
- 0921-5107
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Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p