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Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition

✍ Scribed by Grill, A.; Patel, V.


Book ID
120086668
Publisher
American Institute of Physics
Year
2001
Tongue
English
Weight
338 KB
Volume
79
Category
Article
ISSN
0003-6951

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Ultralow Dielectric Constant Tetravinylt
✍ Nathan J. Trujillo; Qingguo Wu; Karen K. Gleason πŸ“‚ Article πŸ“… 2010 πŸ› John Wiley and Sons 🌐 English βš– 374 KB πŸ‘ 1 views

## Abstract Simultaneous improvement of mechanical properties and lowering of the dielectric constant occur when films grown from the cyclic monomer tetravinyltetramethylcyclotetrasiloxane (V4D4) via initiated chemical vapor deposition (iCVD) are thermally cured in air. Clear signatures from silses