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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Modeling of solvent evaporation effects for hot plate baking of photoresist

✍ Scribed by Mack, Chris A.; DeWitt, David P.; Tsai, Benjamin K.; Yetter, Gil; Nalamasu, Omkaram

No coin nor oath required. For personal study only.

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