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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Novel synthetic aqueous photoresist for CCD micro color filter

✍ Scribed by Shimomura, Koji; Otagaki, Tomoko; Tamagawa, Yoko; Kobayashi, Michiyo; Aoki, Hiromitsu; Sano, Yoshikazu; Terakawa, Sumio; Nalamasu, Omkaram

Book ID: 120547258
Publisher: SPIE
Year: 1994
Weight: 739 KB
Volume: 2195
Category: Article
DOI: 10.1117/12.175395

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