SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - Direct inclusion of the proximity effect in the calculation of kinoforms

✍ Scribed by Bengtsson, Jorgen; Patterson, David O.

• Book ID: 118161131
• Publisher: SPIE
• Year: 1994
• Weight: 411 KB
• Volume: 2194
• Category: Article
• DOI: 10.1117/12.175819