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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Effective light source optimization with the modified beam for depth-of-focus enhancements

✍ Scribed by Ogawa, Tohru; Uematsu, Masaya; Ishimaru, Toshiyuki; Kimura, Mitsumori; Tsumori, Toshiro; Brunner, Timothy A.

No coin nor oath required. For personal study only.

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