SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Quantum chemical studies of chemically amplified resist materials for electron-beam and ArF excimer laser

✍ Scribed by Ushirogouchi, Tohru; Kihara, Naoko; Saito, Satoshi; Naito, Takuya; Asakawa, Koji; Tada, Tsukasa; Nakase, Makoto; Nalamasu, Omkaram

• Book ID: 121380293
• Publisher: SPIE
• Year: 1994
• Weight: 429 KB
• Volume: 2195
• Category: Article
• DOI: 10.1117/12.175337