SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Stochastic acid-based quenching in chemically amplified photoresists: a simulation study

✍ Scribed by Allen, Robert D.; Mack, Chris A.; Biafore, John J.; Somervell, Mark H.; Smith, Mark D.

• Book ID: 120216297
• Publisher: SPIE
• Year: 2011
• Weight: 325 KB
• Volume: 7972
• Category: Article
• DOI: 10.1117/12.879831