SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Study on a few α-disulfone compounds as photoacid generators

✍ Scribed by Guo, Dongfang; Allen, Robert D.; Somervell, Mark H.; Liu, Juan; Wang, Liyuan

• Book ID: 120272544
• Publisher: SPIE
• Year: 2011
• Weight: 290 KB
• Volume: 7972
• Category: Article
• DOI: 10.1117/12.879296