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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - The evolving complexity of patterning materials

✍ Scribed by Shimokawa, Tsutomu; Hishiro, Yoshi; Yamaguchi, Yoshikazu; Shima, Motoyuki; Kimura, Tooru; Takimoto, Yoshio; Nagai, Tomoki; Somervell, Mark H.

Book ID: 120382414
Publisher: SPIE
Year: 2013
Weight: 476 KB
Volume: 8682
Category: Article
DOI: 10.1117/12.2014526

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