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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - The evolution of patterning process models in computational lithography

✍ Scribed by Sturtevant, John L.; Allen, Robert D.

Book ID: 115531424
Publisher: SPIE
Year: 2010
Weight: 697 KB
Volume: 7639
Category: Article
DOI: 10.1117/12.851816

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