SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Simultaneous calibration of acid diffusion and developer loading parameters for computational lithography

✍ Scribed by Parikh, Ashesh; Somervell, Mark H.; Wallow, Thomas I.

• Book ID: 120064862
• Publisher: SPIE
• Year: 2012
• Weight: 246 KB
• Volume: 8325
• Category: Article
• DOI: 10.1117/12.916200