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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Defining and measuring development rates for a stochastic resist

✍ Scribed by Mack, Chris A.; Somervell, Mark H.; Wallow, Thomas I.

Book ID: 120064861
Publisher: SPIE
Year: 2012
Weight: 550 KB
Volume: 8325
Category: Article
DOI: 10.1117/12.916195

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