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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - EUV lithography using water-developable resist material derived from biomass

✍ Scribed by Takei, Satoshi; Oshima, Akihiro; Oyama, Tomoko G.; Ichikawa, Takumi; Sekiguchi, Atsushi; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi; Somervell, Mark H.

Book ID: 121223101
Publisher: SPIE
Year: 2013
Weight: 596 KB
Volume: 8682
Category: Article
DOI: 10.1117/12.2010643

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