SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Polarization selective photoresist based on reactive liquid crystals doped with a dichroic photoinitiator

✍ Scribed by Van, My-Phung; Bastiaansen, Cees W. M.; Broer, Dick J.; Somervell, Mark H.

• Book ID: 120337437
• Publisher: SPIE
• Year: 2013
• Weight: 695 KB
• Volume: 8682
• Category: Article
• DOI: 10.1117/12.2011336