✦ LIBER ✦

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Molecular glass photoresists based on acidolysis of acetal compounds

✍ Scribed by Wang, Liyuan; Zhai, Xiaoxiao; Xu, Na; Henderson, Clifford L.

No coin nor oath required. For personal study only.

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