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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Metal-polymer nanocomposite resist: a step towards in-situ nanopatterns metallization

✍ Scribed by Abargues, R.; Martinez-Marco, M. L.; Rodriguez-Canto, P. J.; Marques-Hueso, J.; Martinez-Pastor, J. P.; Somervell, Mark H.

Book ID: 120167471
Publisher: SPIE
Year: 2013
Weight: 1004 KB
Volume: 8682
Category: Article
DOI: 10.1117/12.2011555

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