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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Stochastic exposure kinetics of EUV photoresists: a simulation study

✍ Scribed by Mack, Chris A.; Thackeray, James W.; Biafore, John J.; Smith, Mark D.; La Fontaine, Bruno M.; Naulleau, Patrick P.

Book ID: 120216298
Publisher: SPIE
Year: 2011
Weight: 441 KB
Volume: 7969
Category: Article
DOI: 10.1117/12.881066

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