SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Magnetic mitigation of debris for EUV sources

✍ Scribed by Elg, D.; Naulleau, Patrick P.; Sporre, J.; Curreli, D.; Ruzic, D. N.; Umstadter, K. R.

• Book ID: 120199493
• Publisher: SPIE
• Year: 2013
• Weight: 876 KB
• Volume: 8679
• Category: Article
• DOI: 10.1117/12.2011519