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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Experimental verification of EUV mask limitations at high numerical apertures

✍ Scribed by Chao, Rikon; Graeupner, Paul; Gullikson, Eric; Kim, Seong-Sue; Neumann, Jens-Timo; Miyakawa, Ryan; Seo, Hwan-Seok; Neureuther, Andy; Naulleau, Patrick; Naulleau, Patrick P.

Book ID: 121430638
Publisher: SPIE
Year: 2013
Weight: 373 KB
Volume: 8679
Category: Article
DOI: 10.1117/12.2013209

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