SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - CO 2 /Sn LPP EUV sources for device development and HVM

✍ Scribed by Brandt, David C.; Fomenkov, Igor V.; Farrar, Nigel R.; La Fontaine, Bruno; Myers, David W.; Brown, Daniel J.; Ershov, Alex I.; Sandstrom, Richard L.; Vaschenko, Georgiy O.; Bowering, Norbert R.; Das, Palash; Fleurov, Vladimir B.; Zhang, Kevin; Srivastava, Shailendra N.; Ahmad, Imtiaz; Rajyaguru, Chirag; De Dea, Silvia; Dunstan, Wayne J.; Baumgart, Peter; Ishihara, Toshi; Simmons, Rod D.; Jacques, Robert N.; Bergstedt, Robert A.; Porshnev, Peter I.; Wittak, Christopher J.; Rafac, Robert J.; Grava, Jonathan; Schafgans, Alexander A.; Tao, Yezheng; Hoffmann, Kay; Ishikawa, Tedsuja; Evans, David R.; Rich, Spencer D.; Naulleau, Patrick P.

• Book ID: 120083979
• Publisher: SPIE
• Year: 2013
• Weight: 997 KB
• Category: Article
• DOI: 10.1117/12.2011212