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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

✍ Scribed by Glatzel, Holger; Ashworth, Dominic; Bremer, Mark; Chin, Rodney; Cummings, Kevin; Girard, Luc; Goldstein, Michael; Gullikson, Eric; Hudyma, Russ; Kennon, Jim; Kestner, Bob; Marchetti, Lou; Naulleau, Patrick; Soufli, Regina; Spiller, Eberhard; Naulleau, Patrick P.

Book ID: 120083981
Publisher: SPIE
Year: 2013
Weight: 520 KB
Volume: 8679
Category: Article
DOI: 10.1117/12.2012698

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