✦ LIBER ✦

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Reactive ion etching of fluorine containing photoresist

✍ Scribed by Patel, Kaushal S.; Pham, Victor; Li, Wenjie; Khojasteh, Mahmoud; Varanasi, Pushkara Rao; Lin, Qinghuang

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

SPIE Proceedings [SPIE SPIE 31st Interna

✍ Audran, S.; Faure, B.; Mortini, B.; Aumont, C.; Tiron, R.; Zinck, C.; Sanchez, Y 📂 Article 📅 2006 🏛 SPIE ⚖ 294 KB

SPIE Proceedings [SPIE SPIE 31st Interna

✍ Graves, Trey; Smith, Mark D.; Mack, Chris A.; Flagello, Donis G. 📂 Article 📅 2006 🏛 SPIE ⚖ 610 KB

SPIE Proceedings [SPIE SPIE 31st Interna

✍ Burnett, John H.; Kaplan, Simon G.; Shirley, Eric L.; Horowitz, Deane; Clauss, W 📂 Article 📅 2006 🏛 SPIE ⚖ 554 KB

SPIE Proceedings [SPIE Advanced Lithogra

✍ Park, Joon-Min; Lee, Ji-Eun; Kim, Moon-Seok; Kim, Jung-Hun; Kim, Jai-Soon; Lee, 📂 Article 📅 2007 🏛 SPIE ⚖ 511 KB

SPIE Proceedings [SPIE SPIE 31st Interna

✍ Ivonin, Igor; Sandstrom, Tor; Flagello, Donis G. 📂 Article 📅 2006 🏛 SPIE ⚖ 743 KB

SPIE Proceedings [SPIE SPIE 31st Interna

✍ Jung, Mi-Rim; Kwak, Eun-A; Oh, Hye-Keun; Shim, Seong-Bo; Choi, Na-Rak; Kim, Jai- 📂 Article 📅 2006 🏛 SPIE ⚖ 353 KB