SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Study of dynamical formation and shape of microlenses formed by the reflow method

✍ Scribed by Audran, S.; Faure, B.; Mortini, B.; Aumont, C.; Tiron, R.; Zinck, C.; Sanchez, Y.; Fellous, C.; Regolini, J.; Reynard, J. P.; Schlatter, G.; Hadziioannou, G.; Lin, Qinghuang

• Book ID: 121084216
• Publisher: SPIE
• Year: 2006
• Weight: 294 KB
• Volume: 6153
• Category: Article
• DOI: 10.1117/12.656371