SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

✍ Scribed by Cho, In Wook; Park, Joon-Min; Kim, Hyunsu; Hong, Joo-Yoo; Kim, Seong-Sue; Cho, Han-Ku; Oh, Hye-Keun; Henderson, Clifford L.

• Book ID: 121084223
• Publisher: SPIE
• Year: 2009
• Weight: 933 KB
• Volume: 7273
• Category: Article
• DOI: 10.1117/12.814108