𝔖 Bobbio Scriptorium

✦ LIBER ✦

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Modeling of linewidth measurement in SEMs using advanced Monte Carlo software

✍ Scribed by Babin, S.; Borisov, S.; Ivanchikov, A.; Ruzavin, I.; Archie, Chas N.

Book ID: 120029565
Publisher: SPIE
Year: 2006
Weight: 242 KB
Volume: 6152
Category: Article
DOI: 10.1117/12.673532

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

SPIE Proceedings [SPIE SPIE 31st Interna

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Study of critical dimension and overlay measurement methodology using SEM image analysis for process control

✍ Lee, Tae Yong; Lee, Byoung Ho; Chin, Soo Bok; Cho, Young Sun; Hong, Jun Sik; Hon 📂 Article 📅 2006 🏛 SPIE ⚖ 670 KB

SPIE Proceedings [SPIE SPIE Advanced Lit

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Time dependence of SEM signal due to charging: measurements and simulation using Monte Carlo software

✍ Abe, H.; Babin, S.; Borisov, S.; Hamaguchi, A.; Ivanchikov, A.; Kadowaki, M.; Ya 📂 Article 📅 2009 🏛 SPIE ⚖ 527 KB

SPIE Proceedings [SPIE SPIE 31st Interna

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Spatial analysis of line-edge roughness through scaling and fractal concepts using AFM techniques

✍ Li, Ning; Zhao, Xuezeng; Wang, Weijie; Li, Hongbo; Archie, Chas N. 📂 Article 📅 2006 🏛 SPIE ⚖ 336 KB

SPIE Proceedings [SPIE SPIE 31st Interna

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Bossung curves: an old technique with a new twist for sub-90-nm nodes

✍ Zavecz, Terrence E.; Archie, Chas N. 📂 Article 📅 2006 🏛 SPIE ⚖ 599 KB

SPIE Proceedings [SPIE Advanced Lithogra

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Monte Carlo modeling of secondary electron imaging in three dimensions

✍ Villarrubia, John S.; Ritchie, Nicholas W. M.; Lowney, Jeremiah R.; Archie, Chas 📂 Article 📅 2007 🏛 SPIE ⚖ 461 KB

SPIE Proceedings [SPIE SPIE 31st Interna

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Evaluation of damage induced by electron beam irradiation to MOS gate pattern and method for damage-free inspection

✍ Matsui, Miyako; Machida, Syuntaro; Mine, Toshiyuki; Hozawa, Kazuyuki; Watanabe, 📂 Article 📅 2006 🏛 SPIE ⚖ 485 KB