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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Evaluation of damage induced by electron beam irradiation to MOS gate pattern and method for damage-free inspection

✍ Scribed by Matsui, Miyako; Machida, Syuntaro; Mine, Toshiyuki; Hozawa, Kazuyuki; Watanabe, Kikuo; Goto, Yasushi; Inoue, Jiro; Nagaishi, Hiroshi; Archie, Chas N.

Book ID: 120350776
Publisher: SPIE
Year: 2006
Weight: 485 KB
Volume: 6152
Category: Article
DOI: 10.1117/12.655502

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