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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Spatial analysis of line-edge roughness through scaling and fractal concepts using AFM techniques

✍ Scribed by Li, Ning; Zhao, Xuezeng; Wang, Weijie; Li, Hongbo; Archie, Chas N.

Book ID: 120770300
Publisher: SPIE
Year: 2006
Weight: 336 KB
Volume: 6152
Category: Article
DOI: 10.1117/12.656000

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