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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Evaluation of partial coherent imaging using the transfer function in immersion lithography

✍ Scribed by Jung, Mi-Rim; Kwak, Eun-A; Oh, Hye-Keun; Shim, Seong-Bo; Choi, Na-Rak; Kim, Jai-Soon; Flagello, Donis G.

No coin nor oath required. For personal study only.

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