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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - (Lens) design for (chip) manufacture: lens tolerancing based on linewidth calculations in hyper-NA immersion lithography systems

✍ Scribed by Gordon, R. L.; Rimmer, M. P.; Flagello, Donis G.

No coin nor oath required. For personal study only.

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