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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - XLA-300: the fourth-generation ArF MOPA light source for immersion lithography

✍ Scribed by Trintchouk, Fedor; Ishihara, Toshihiko; Gillespie, Walter; Ness, Richard; Bergstedt, Robert; Wittak, Christian; Perkins, Richard; Flagello, Donis G.

Book ID: 121475510
Publisher: SPIE
Year: 2006
Weight: 503 KB
Volume: 6154
Category: Article
DOI: 10.1117/12.658723

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